Ultra-high resolution diffraction analysis of single-crystalline substrate wafers can be enable by utilizing triple-axis X-ray geometry combined with a highly accurate goniometer. Triple axis refers to three independent crystalline diffraction components. The sample forms one axis with the other two axes associated with incident and diffracted beam channel cut multi-bounce monochromator crystals. In combination with an XY mapping stage, the variability of the crystalline lattice parameter can be evaluated across a single-crystal wafer.
SmartLab
Automated multipurpose X-ray diffractometer (XRD) with Guidance software
